Molecular Photochemistry and PhotoPolymerization
Development of photosensitive resins for specific applications
J.M. Becht, C. Dietlin, J. Lalevée*, F. Morlet-Savary, M. Schmitt
*Contact : jacques.lalevee@uha.fr
The development of new photosensitive resins for radical polymerisation, cationic polymerisation, or the preparation of interpenetrating polymer networks (IPN) requires extensive fundamental research into both photoinitiator systems (use of mild irradiation conditions, etc.) and all the components of the photopolymerisable resin (new monomers/oligomers, hybrid polymerisation, stabilisers, fillers, etc.). It is through the complete optimisation of the photopolymerisable system that the final properties for specific applications can be improved, e.g. dental materials, inks, paints, surgical adhesives, functional coatings, construction materials, 3D printing, etc. In this field, and thanks to numerous collaborations with industrial partners, the group is familiar with composite materials based on ZnO, zeolites and graphene, for example, but also with special techniques such as filament printing, frontal polymerisation and fibre-filled resins and textiles. Understanding reaction mechanisms is also an important factor in the development of these photosensitive systems. Bio-based or degradable/recyclable systems are also being developed.
Publications
Y Zhang, S Liu, H Chen, L Josien, G Schrodj, A Simon-Masseron, J Lalevée Development of a Zeolite/Polymer-Based Hydrogel Composite through Photopolymerization for 3D Printing Application, Macromolecular Materials and Engineering, 306, 8 2100129, 2021.
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